<?xml version="1.0" encoding="utf-8"?><!DOCTYPE Zthes SYSTEM "http://zthes.z3950.org/xml/zthes-05.dtd">  <Zthes><term><termId>31341699</termId><termName>atomic layer deposition</termName><termType>PT</termType><termNote><![CDATA[ A technique for depositing a film onto a surface in monolayers by utilizing a self-limiting chemical reaction. It is a vapor phase technique capable of producing thin films of a variety of materials. ]]></termNote><termCreatedDate>2026-03-30 20:32:09</termCreatedDate><relation><relationType>UF</relationType><termId>31341700</termId><termName>ALD</termName><termType>ND</termType></relation><relation><relationType>BT</relationType><termId>31317963</termId><termName>coating</termName><termType>PT</termType></relation></term>  </Zthes>