Hierarchy classification:

1. top of the aat hierarchies
2. Activities Facet
3. Processes and Techniques (hierarchy name)
4. [processes and techniques by specific type]
5. [additive and joining processes and techniques]
6. [surface covering processes and techniques]
7. coating (process)

Anotations

Scope note:

A chemical vapor deposition process used to deposit a single thin layer (thickness less than 20 micrometer) or multiple thin layers of materials in a gas state (vapor) to a solid state over a substrate. In PECVD, deposition is achieved by introducing reactant gases between parallel electrodes—a grounded electrode and an RF (Radio Frequency)-energized electrode. The capacitive coupling between the electrodes excites the reactant gases into a plasma, which induces a chemical reaction and results in the reaction product being deposited on the substrate. In conservation, PECVD has been used for protection or surface modification of metallic artifacts.